Please use this identifier to cite or link to this item:
http://thuvien.ued.udn.vn/handle/TVDHSPDN_123456789/10771| Title: | Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor |
| Authors: | Zhengwen Li Antti Rahtu Roy G. Gordon |
| Issue Date: | 2006 |
| Citation: | Journal of The Electrochemical Society, 153 11 C787-C794 2006 |
| URI: | http://thuvien.ued.udn.vn/handle/TVDHSPDN_123456789/10771 |
| Appears in Collections: | Hóa học (TC) |
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